Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2nm. The waveguides were patterned along the [112] direction on a [110] SOI substrate. The waveguide boundaries are decided by the [111] planes which are normal to the [110] surface. Fabricated waveguides show minimum propagation loss of 0.85 dB/cm for TE polarization and 1.08dB/cm for TM polarization. The fabricated grating couplers show coupling efficiency of -4.16dB at 1570nm with 3dB bandwidth of 46nm.

Abstract licence: CC BY

25 more references, whose wording the paper’s licence keeps private.

A person counts once a day per paper. We keep no cookie and no address: a reader is a hash that changes every day. Any month under five reads shows no number.