Indium Silicon Oxide TFT Fully Photolithographically Processed for Circuit Integration

A new class of amorphous oxide semiconductors based on InO_x doped with Ti, W or Si seems to show great promise for large area, flexible, electronics. Of particular interest is the In₂O₃:SiO₂ system as it has a relatively large bond dissociation energy, hence highly suited for long-term environmental stability. In this paper, we present a sub-200°C fully photolithographically-processed indium oxide thin film transistor that is fully compatible to circuit integration on plastic substrates. The TFTs typically showed a mobility of 5 cm²/Vs, a threshold voltage of -0.16 V and a subthreshold swing of 312 mV/dec. We report on its stability behavior when subject to electrical bias stress and negative bias illumination stress, along with a pulse-based compensation solution for persistent photoconductivity arising from the latter. Following static characterization and subsequent parameter extraction of the indium silicon oxide TFT, design considerations are presented along with measurement results of a fully integrated TFT voltage amplifier with high impedance subthreshold loading.

Abstract licence: CC BY-NC-ND

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