Monolayer Transition Metal Dichalcogenide Channel-Based Tunnel Transistor
Ram Krishna Ghosh, Santanu Mahapatra
IEEE Journal of the Electron Devices Society · 2013
doi:10.1109/jeds.2013.2292799 (opens in a new tab)
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Abstract
We investigate the gate controlled direct band-to-band tunneling (BTBT) current in monolayer transition-metal dichalcogenide (MX<sub>2</sub>) channel-based tunnel field effect transistor (TFET). Five MX<sub>2</sub> materials (MoS<sub>2</sub>,MoSe<sub>2</sub>,MoTe<sub>2</sub>,WS<sub>2</sub>,WSe<sub>2</sub>) in their 2-D sheet forms are considered for this purpose. We first study the real and imaginary band structure of those MX<sub>2</sub> materials by density-functional theory (DFT), which is then used to evaluate the gate-controlled current under the Wentzel-Kramers-Brillouin (WKB) approximation. It is shown that all five MX<sub>2</sub> support direct BTBT in their monolayer sheet forms and offer an average ON current and subthreshold slope of 150 μA/μm (at V<sub>d</sub>=0.1 V) and 4 mV/dec, respectively. Furthermore, we also demonstrate the strain effect on the complex band structures and the performances of MX<sub>2</sub> based TFETs. It is observed that a certain tensile strain becomes favorable for the improvement of ON-current performances.
Abstract licence: CC BY-NC-ND
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