Skip to content
naulon
Not checkedNot checked for notices yet.

Monolayer Transition Metal Dichalcogenide Channel-Based Tunnel Transistor

Ram Krishna Ghosh, Santanu Mahapatra

IEEE Journal of the Electron Devices Society · 2013

doi:10.1109/jeds.2013.2292799 (opens in a new tab)

We email you when a new notice or a question about this paper appears.

Abstract

We investigate the gate controlled direct band-to-band tunneling (BTBT) current in monolayer transition-metal dichalcogenide (MX<sub>2</sub>) channel-based tunnel field effect transistor (TFET). Five MX<sub>2</sub> materials (MoS<sub>2</sub>,MoSe<sub>2</sub>,MoTe<sub>2</sub>,WS<sub>2</sub>,WSe<sub>2</sub>) in their 2-D sheet forms are considered for this purpose. We first study the real and imaginary band structure of those MX<sub>2</sub> materials by density-functional theory (DFT), which is then used to evaluate the gate-controlled current under the Wentzel-Kramers-Brillouin (WKB) approximation. It is shown that all five MX<sub>2</sub> support direct BTBT in their monolayer sheet forms and offer an average ON current and subthreshold slope of 150 &#x03BC;A/&#x03BC;m (at V<sub>d</sub>=0.1 V) and 4 mV/dec, respectively. Furthermore, we also demonstrate the strain effect on the complex band structures and the performances of MX<sub>2</sub> based TFETs. It is observed that a certain tensile strain becomes favorable for the improvement of ON-current performances.

Abstract licence: CC BY-NC-ND

Reads

Read by people on this page

None yet.

Checked or read by AI through naulon

None yet.

A person counts once a day per paper. We keep no cookie and no address: a reader is a hash that changes every day. Any month under five reads shows no number.

Are you an author?

Is this your paper?

Claim it to add your note and be paid when agents cite it. Free.